Chromium Etchants should be operated in a well ventilated hood.Ĭhromium Cermet Etchant TFE is a selective chromium etchant for microelectronics applications. Etch times range from 15 seconds to 60 seconds at room temperature. KLT6000 Series, KLT 5300 Series, HARE SQ (SU-8 type), TRANSIST, or PKP-308PIĮtching temperature varies depending on film thickness. PROPERTIES OF TRANSENE CHROMIUM ETCHANT 1020AC How do I increase the etch rate? Increase the rate of stirring or agitation. Increase the rate of stirring or agitation.Īdding 1 part deionized water to 2 parts etchant will reduce the etch rate approximately 50%. The rate will approximately double with every 10☌ increase in temperature.Ģ. PROPERTIES OF TRANSENE CHROMIUM ETCHANT 1020 How do I increase the etch rate?ġ. Minimal undercutting is achieved with Chromium Etchant 1020AC. Chromium Etchant 1020 is filtered to remove all particulates above 0.2 microns. Both etchants are compatible with positive and negative photoresists. Chromium Etchant 1020AC is nitric-acid free and exhibits a slower etch rate. Transene Chromium Etchants 10AC are high purity ceric ammonium nitrate systems for precise, clean etching of chromium and chromium oxide films. Compatible with copper, nickel, and gold.ġ0AC Literature Citations Referencing Application of Chromium Etchant 1020 Ideal for high precision photomask etching.įor chromium-silicon films. Slower etch rate to eliminate undercutting and for broader compatibility High purity formulations filtered to 0.2 micron are ideal for critical devices. Chromium Etchants provide fine-line control with minimal undercutting. Etchants for chromium thin films for microelectronics applications offer excellent compatibility with positive and negative photoresists.
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